Photopatterned product of silicone polyamic acid on a transparent substrate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Aug 8, 1989
Issued Date -
N/A
app pub date -
Aug 8, 1988
filing date -
Apr 3, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyimide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully