Thin film transistor

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United States of America Patent

PATENT NO 4849797
SERIAL NO

07145949

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Abstract

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In a thin film transistor which has an active layer formed between source and drain electrodes, a gate insulating film formed in contact with the active layer, and a gate electrode formed in contact with the gate insulating film, the photoconductivity of the active layer is reduced by forming the active layer of amorphous silicon carbide (a-Si.sub.1-x C.sub.x) whose carbon content x is greater than 0.1.

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Patent Owner(s)

Patent OwnerAddress
TPO HONG KONG HOLDING LIMITEDPHILIPS ELECTRONICA BUILDING 5 SCIENCE PARK EAST AVENUE SHETIN HONG KONG SAR

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aoki, Shigeo Habikino, JP 33 1328
Ukai, Yasuhiro Kobe, JP 39 1506

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