Wafer handling system
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United States of America Patent
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-
Jul 11, 1989
Grant Date -
N/A
app pub date -
Feb 9, 1987
filing date -
Feb 9, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Apparatus is set forth for prealigning the transport stage of an automated wafer handling lithographic system. The wafer is first rotated and its displacement in X, Y, and .THETA. from a desired orientation is determined. Rotation of the wafer is stopped when its angular position reaches a desired orientation. The wafer chuck of the transport stage is then displaced to compensate for any deviation of the wafer in the X and Y directions from a desired rectilinear orientation. This permits the wafer stage to present the wafer to the exposure station of a lithographic system aligned in the X, Y and .theta. directions.
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