Atmospheric pressure chemical vapor deposition apparatus
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United States of America Patent
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May 30, 1989
Grant Date -
N/A
app pub date -
Dec 4, 1987
filing date -
Dec 4, 1987
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A conveyorized atmospheric pressure chemical vapor deposition apparatus having a heated muffle and a conveyor belt for conveying objects to be coated through said muffle. At least one chemical vapor deposition zone is provided in the muffle. An injector assembly is also provided for uniformly injecting first and second reactant gases in the deposition zone across the width of the conveyor belt and against the surfaces of the objects to be coated. The gases exit from slots connected to distribution plenums. Polished cooled surfaces are used on the injector assembly to minimize deposition of chemicals thereon.
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