Illumination system for x-ray lithography
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United States of America Patent
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May 16, 1989
Issued Date -
N/A
app pub date -
Jun 19, 1987
filing date -
May 14, 1986
priority date (Note) -
Expired
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Abstract
This invention is directed to an improvement in an x-ray lithography system having an x-ray point source of radiation, a wafer disposed in spaced relationship with respect to the source, and a mask disposed between the source and the wafer whereby radiation from the source passes through the mask to the wafer, said improvement comprising the provision of an x-ray absorbent element mounted between the source and the wafer, said element having a radial absorption gradient profile to compensate for radial flux variation of the x-rays.
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