Discharge reaction apparatus utilizing dynamic magnetic field
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United States of America Patent
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May 9, 1989
Issued Date -
N/A
app pub date -
Oct 20, 1987
filing date -
Aug 31, 1984
priority date (Note) -
Expired
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Abstract
A discharge reaction apparatus utilizing dynamic magnetic field for subjecting the surface of an object to a depositing or an etching process is disclosed. The apparatus comprises a member for generating dynamic magnetic field along the surface of an electrode and a member for limiting or forbidding the circulating motion of electron around the electrode.
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