Exposure control system for full field photolithography using pulsed sources
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United States of America Patent
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Feb 14, 1989
Grant Date -
N/A
app pub date -
Feb 19, 1988
filing date -
Feb 19, 1988
priority date (Note) -
Expired
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Abstract
A photolithography exposure control system tolerant of noisy pulsed light sources having a controllable variable attenuator. A detector monitors the exposure dose of a light pulse enabling a controller to trigger another light pulse, when a predetermined attenuator is positioned in its path. A high degree of exposure control is achieved with a minimum number of light pulses or shots.
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