Phosphorous planar dopant source for low temperature applications
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United States of America Patent
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Jan 24, 1989
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N/A
app pub date -
May 29, 1987
filing date -
May 29, 1987
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Expired
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Abstract
A boron-containing heterocyclic compound prepared by reacting a primary amine of ammonia with an alkylene oxide or epoxide and then reacting concurrently or subsequently this reaction intermediate with a boric acid. This boron-containing heterocyclic compound may further be reacted with a metal metalloid or other metal compound and even further contain sulfur, such as a sulfide group.
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