Reflectivity and resolution X-ray dispersive and reflective structures for carbon, beryllium and boron analysis

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United States of America Patent

PATENT NO 4785470
SERIAL NO

06856685

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Abstract

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X-ray dispersive and reflective structures and materials are constructed which exhibit improved characteristics in specific ranges of interest. The structures are formed of metallic and non-metallic layer pairs. The structures are formed of alternating layers of Cr:C, Ni:C or V:C for carbon analysis and Mo:B.sub.4 C for beryllium an boron analysis. The layered structures can be formed from Ni:C for analysis of both carbon and boron.

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Patent Owner(s)

Patent OwnerAddress
OVONIC SYNTHETIC MATERIALS COMPANY INC A CORP OF DE1100 WEST MAPLE ROAD TROY MI 48084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hart, Keith L Flat Rock, MI 4 105
Wood, James L Westland, MI 21 316

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