Method of coating and imaging photopatternable silicone polyamic acid
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United States of America Patent
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Nov 1, 1988
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N/A
app pub date -
Apr 3, 1987
filing date -
Apr 3, 1987
priority date (Note) -
Expired
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Abstract
Photopatternable silicone polyamic acid can be spun onto a substrate and thereafter used in combination with a photoresist as an antireflective coating or as a patterned silicone polyamide. The silicone polyamic acid can be used with an absorbing dye, or it can be tinted with an organic dye to provide color filters when applied on a transparent substrate.
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