Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds
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United States of America Patent
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Jul 19, 1988
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Apr 17, 1987
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Aug 22, 1985
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Abstract
The invention features a new series of triazine compounds which are characterized by their ability to generate free radicals upon irradiation in a desired optical region, such that they are useful in the fabrication of lithographic plates having improved exposure speed, development, print-out, and contrast characteristics.
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