Method of producing wafer

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United States of America Patent

PATENT NO 4756796
SERIAL NO

06917726

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Abstract

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There is disclosed a method of providing an elongated stock; producing a wafer comprising the steps of processing one end face of an elongated stock to form a first flat surface; cutting through one end portion of the stock transversely by a cutter to provide a slice of a predetermined thickness having opposite side faces defined respectively by the first flat surface and a cut surface subjected to the cutting; and processing the cut surface of the slice to form a second flat surface, using the first flat surface as a reference surface, thereby providing the wafer.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI MATERIALS SILICON CORPORATION5-1 OTEMACHI 2-CHOME CHIYODA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Saitou, Yuichi Urawa, JP 3 21

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