Photosensitive solubilization inhibition agents, and deep ultra-violet lithographic resist compositions
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United States of America Patent
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Jun 21, 1988
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app pub date -
Oct 2, 1986
filing date -
Oct 2, 1986
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Abstract
Photosensitive solubilization inhibitor compounds of the formula ##STR1## wherein: x is an integer equal to the valence or functionality of the radical R, and R is a radical selected from the group consisting of the residue of a mono-, di-, tri- or polyfunctional alkanol or silicon-containing alkanol and is attached to the oxy atom of the carboxyl group through a carbon atom. Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and the photosensitive solubilization inhibition agents. Lithographic resist images are formed with the deep ultra-violet photoresists upon exposure to deep ultra-violet light.
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