Method and aparatus for determining surface profiles
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United States of America Patent
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May 31, 1988
Issued Date -
N/A
app pub date -
Jul 3, 1985
filing date -
Apr 19, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A system for determining surface profiles of specimens such as semiconductor wafers includes a drive for mounting the wafer for oscillatory movement along a line and an optical imaging system overlying the wafer for focusing a beam on a small sport on the wafer and including a photodetector for detecting the reflected sport from the wafer. The spot is scanned along the line on the wafer while the focal depth of the imaging system is progressively changed while the photodetector and connected digital circuitry generate a plurality of spaced output signals for each scan along the line so that data comprised of a series of spaced signals are provided at a plurality of focus levels extending through the surface profile of the wafer. Computer means are provided for analyzing the data and providing a graphical output of the surface profile.
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