X-ray dispersive and reflective structures

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United States of America Patent

PATENT NO 4727000
SERIAL NO

06876292

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Abstract

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X-ray dispersive and reflective structures and materials are provided which exhibit at least one third of the theoretical integral reflection coefficient for the structures in the range of interest without fluorescence or absorption edges. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.

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Patent Owner(s)

Patent OwnerAddress
OVONIC SYNTHETIC MATERIALS COMPANY INC A CORP OF DE1100 WEST MAPLE ROAD TROY MI 48084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Flessa, Steven A Southfield, MI 2 54
Hart, Keith L Flat Rock, MI 4 105
Keem, John Bloomfield Hills, MI 13 143
Ovshinsky, Stanford R Bloomfield Hills, MI 371 21172
Sztaba, Lennard Hamtramck, MI 2 54
Wood, James L Westland, MI 21 316

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