Projection aligner with a sensor for monitoring light quantity
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United States of America Patent
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Oct 20, 1987
Issued Date -
N/A
app pub date -
Jan 29, 1986
filing date -
Aug 9, 1982
priority date (Note) -
Expired
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Abstract
A projection aligner wherein light from a light source is passed through a mask so as to focus an image of a pattern of the mask on a wafer, characterized in that at least one sensor for monitoring a luminosity and a distribution thereof is disposed in an optical path between the light source and the mask, whereby a luminosity and a distribution thereof on the wafer can be controlled to proper values. The projection aligner is effective for application to minute processing technologies for the production of semiconductor devices, etc.
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