X-ray dispersive and reflective structures and method of making the structures

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United States of America Patent

PATENT NO 4693933
SERIAL NO

06547338

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Abstract

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X-ray dispersive and reflective structures and materials are provided which exhibit improved resolution and reflectivity in specific ranges of interest without substantial fluorescence or absorption edges. The structures are formed of metallic and non-metallic layer pairs and can include a buffer layer between each layer to prevent interdiffusion to stabilize the structures. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.

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Patent Owner(s)

Patent OwnerAddress
OVONIC SYNTHETIC MATERIALS COMPANY INC1788 NORTHWOOD DRIVE TROY MI 48084

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Flessa, Steven A Southfield, MI 2 54
Hart, Keith L Flat Rock, MI 4 105
Keem, John E Bloomfield Hills, MI 15 586
Ovshinsky, Stanford R Bloomfield Hills, MI 371 21172
Sztaba, Lennard Hamtranck, MI 2 54
Wood, James L Westland, MI 21 316

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