Process of using photoresist treating composition containing a mixture of a hexa-alkyl disilazane, propylene glycol alkyl ether and propylene glycol alkyl ether acetate
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 8, 1987
Grant Date -
N/A
app pub date -
Oct 28, 1985
filing date -
Oct 28, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Loading Importance Indicators... 
Abstract
The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.
Loading the Abstract Image...
OK
First Claim
Family
Loading Family data...
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully