Anodized memory disk substrate and method of manufacturing the same
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United States of America Patent
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Jul 7, 1987
Grant Date -
N/A
app pub date -
Sep 4, 1986
filing date -
Sep 4, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An anodized memory disk substrate is disclosed, which is characterized in having an anodic film having excellent heat resistance and hardness and having a thickness of not less than 3 .mu.m on the surface of aluminum or an aluminum alloy substrate imparted thereto by means of chromic acid-sulfuric acid mixture. The method described therefor is that, after the formation of anodic film having a film thickness of not less than 4 .mu.m on the surface of substrate, polishing is carried out so as to leave behind the anodic film having a film thickness of at least 3 .mu.m. Heat treatment may be made before or after the polishing.
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