Adsorbent for use in selective gas adsorption-separation and a process for producing the same

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United States of America Patent

PATENT NO 4675309
SERIAL NO

06854444

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Abstract

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There is disclosed an adsorbent comprising a macroreticular polystyrene type resin having amino groups selected from the group consisting of primary, secondary and tertiary amino groups and combinations thereof, and a copper(I) halide fixed to the macroreticular polystyrene type resin. Such an adsorbent has been found to be advantageously employed for the selective adsorption-separation of a gas from a gaseous mixture.

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Patent Owner(s)

Patent OwnerAddress
HIDEFUMI HIRAIMEGURO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirai, Hidefumi 14-10, Yutenji 1-chome, Meguro-ku, Tokyo, JP 18 268
Komiyama, Makoto Tokyo, JP 32 287
Kurima, Kazunori Tokyo, JP 3 73
Wada, Keiichiro Tokyo, JP 8 184

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