Fluidized bed heater for semiconductor processing
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United States of America Patent
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Jun 16, 1987
Grant Date -
N/A
app pub date -
Mar 1, 1985
filing date -
Mar 1, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A fluidized bed heater for uniformly raising the surface temperature of semiconductor wafers. The heater includes a mantle having at least one planar surface for supporting wafers, a bed of particles adjacent the mantle which is fluidized by passing a gas through the particle bed, and a bed heater which heats the bed particles to a uniform temperature so that wafers supported on the planar surface are heated to a uniform temperature. A reactor is also described which contains a reactor chamber for processing semiconductor wafers and a fluidized bed heater for uniformly heating semiconductor wafers in the reactor chamber.
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