Method for etching a flat apertured mask for use in a cathode-ray tube
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United States of America Patent
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May 12, 1987
Issued Date -
N/A
app pub date -
Dec 23, 1985
filing date -
Jun 24, 1983
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Expired
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Abstract
A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.
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