Method of forming highly sensitive photoresist film in the absence of water
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United States of America Patent
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May 5, 1987
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N/A
app pub date -
Aug 7, 1985
filing date -
Aug 7, 1985
priority date (Note) -
Expired
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Abstract
Method of forming highly sensitive, high resolution positive photoresist compositions that are developed from polycarbonates derived from t-diols and various diphenols and homopolycarbonates from t-diols, mixed with 2-10% of onium salts wtih complex metal halide counterions. The high sensitivity of the photoresist compositions is due to the thermodynamic stabilities of the resulting incipient dicarbocations and dienes.
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