Sheet material of mechanically and electrochemically roughened aluminum, as a support for offset-printing plates

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4655136
SERIAL NO

06577381

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

Disclosed is a sheet, foil or strip material comprising aluminum or an alloy thereof, which is first mechanically and then electrochemically roughened on one or both surfaces to produce the following parameters: (a) from about 60 to 90% of the surface comprise a basic structure, in which the arithmetic mean of the distribution of diameters D.sub.a1 of the pits is in the range from about 1 to 5 microns, (b) from about 10 to 40% of the surface comprise a superimposed structure formed of elevations having an average base F from about 100 to 1,500 microns.sup.2, in which the arithmetic mean of the distribution of diameters D.sub.a2 of the pits is in the range from about 0.1 to 1.0 micron, (c) the center line average roughnesses R.sub.a of the entire surface are at least 0.6 micron, and (d) the contact area t.sub.pmi of the entire surface is not more than about 20% at a stylus working depth of 0.125 micron and not more than about 70% at a stylus working depth of 0.4 micron. Also disclosed is a process for the production of this material and offset-printing plates which comprise a layer of this material provided with a radiation-sensitive coating.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
HOECHST AKTIENGESELLSCHAFT A GERMAN CORPD-6230 FRANKFURT AM MAIN 80

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bohm, Dieter Eltville, DE 3 69
Niederstatter, Walter Eltville, DE 3 23
Reiss, Kurt Wiesbaden, DE 5 42
Sprintschnik, Gerhard Taunusstein, DE 14 151
Stroszynski, Joachim Wiesbaden, DE 11 140

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation