Photosensitive compounds and lithographic composition or plate therewith having o-quinone diazide sulfonyl ester group
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United States of America Patent
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Feb 3, 1987
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N/A
app pub date -
Mar 29, 1985
filing date -
Mar 29, 1985
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Expired
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Abstract
Quinone diazide derivatives of adamantane, and especially quinone diazide derivatives of 1,3-dialkyl-5,7-bis(hydroyphenol) adamantanes, have been found to provide unique properties when coated on metal substrate in the preparation of both positive and negative working lithographic plates. The improved lithographic plates are characterized by enhanced speed, coating oleophilicity, alkali resistance, developer latitude and development speed.
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