Plasma CVD apparatus
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United States of America Patent
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Jan 6, 1987
Grant Date -
N/A
app pub date -
Jan 16, 1985
filing date -
Mar 28, 1984
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In the particular embodiments described in the specification, a plasma CVD apparatus has a plurality of pairs of electrodes and equal discharges are attained by controlling the power supplied to the high frequency electrodes independently of one another so as to effect the formation of uniform films. Electromagnetic mutual interference between the electrodes is reduced by allowing the high frequency power supplies for supplying the power to function independently and providing a phase regulator if necessary.
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