Method of manufacture of a semiconductor device
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United States of America Patent
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Dec 16, 1986
Grant Date -
N/A
app pub date -
Sep 13, 1984
filing date -
Sep 21, 1983
priority date (Note) -
Expired
status (Latency Note)
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Abstract
This invention discloses a semiconductor device, and method of manufacturing such device, which provides a high degree of moistureproofing, provides a high production yield, and in which defective elements can be replaced by the use of fuses. A circuit test of the device is conducted while at least part of each of a fuse and a bonding pad is exposed through a first passivation film covering a semiconductor substrate on which circuit elements such as MISFETs and capacitors are formed, and any defective elements are replaced by the use of fuses. Contamination of and damage to the elements during the test can thus be prevented. Thereafter, a second passivation film is formed so as to cover all the essential portions of the fuses and bonding pads. The exposure of cracks in the fuses and bonding pads is thus prevented, and the invasion of moisture, etc., into the lower layers below the fuses and bonding pads is also prevented, thereby improving the moistureproofing and reliability of the device.
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