Method for forming a protective film on a semiconductor body
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United States of America Patent
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-
Dec 9, 1986
Grant Date -
N/A
app pub date -
May 16, 1984
filing date -
May 26, 1983
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In the representative embodiment of the invention described in the specification, a boron coating is applied to a semiconductor body having a protective film of a compound of the semiconductor material by heating the semiconductor body to a temperature below 400.degree. C. in a vacuum chamber, introducing diborane gas into the chamber and causing a glow discharge between two electrodes in the chamber.
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