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Abstract

Linear polysilane-siloxane copolymers having remarkable sensitivity to radiation have the general formula [(SiMe.sub.2).sub.m ].sub.a [(OSiMeR).sub.n ].sub.b wherein Me is a methyl group, R is lower alkyl or phenyl, m=4 to about 30 inclusive, n=1 to about 100 inclusive, a and b may each be 1 to about 10 inclusive, and a units alternate with b units. The copolymers of the invention may be in the form of oligomers, random copolymers where n=1 to 9, block copolymers where n=10 to 100, and mixed (random and block) copolymers. These copolymers may also be in the form of modified copolymers having reactive functional groups such as acrylate, methacrylate, vinyl or other unsaturated substitutions. The copolymers may be produced by formation of a halogen terminated oligomer of a polysilane or polysilane-siloxane copolymer, followed by coupling the oligomers with themselves or with distinct higher molecular weight silanol terminated siloxane species. Depending upon their specific structures, the copolymers respond to electron beam or ultraviolet radiation by depolymerizing, behaving as photoinitiators for acrylate polymerization or cross-linking.

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First Claim