Deep ultra-violet lithographic resist composition and process of using
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United States of America Patent
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Dec 2, 1986
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app pub date -
Sep 12, 1985
filing date -
Oct 7, 1983
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Abstract
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents oligomeric compounds of the formula ##STR1## wherein X is alkylene, arylene, alkoxyalkylene or aralkylene and n is a positive integer such that the molecular weight of the oligomeric compound is from about 500 to about 3000.
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