Deep ultra-violet lithographic resist composition and process of using
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United States of America Patent
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Nov 25, 1986
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N/A
app pub date -
Apr 15, 1985
filing date -
Apr 15, 1985
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Expired
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Abstract
Positive deep ultra-violet photoresists which are base developable comprise base soluble polymers and as photosensitive solubilizing agents compounds of the formula ##STR1## wherein: R.sub.4 is hydrogen or --C(O)R.sub.5 in which R.sub.5 is an alkoxy group having from 1 to about 20 carbon atoms; R.sub.6, R.sub.7, R.sub.8 and R.sub.9 may each be the same or different and be hydrogen or alkyl of from 1 to about 6 carbon atoms when R.sub.4 is --C(O)R.sub.5 ; or when R.sub.4 is either hydrogen or --C(O)R.sub.5, (a) one of either R.sub.6 or R.sub.7 and one of either R.sub.8 and R.sub.9 is hydrogen and the other of either R.sub.6 or R.sub.7 and the other of either R.sub.8 or R.sub.9 which is not hydrogen together form an alkylene group of from 1 to about 6 carbon atoms, or (b) one set of either R.sub.6 and R.sub.7 together or R.sub.8 and R.sub.9 together is a cycloalkyl group of from 4 to 8 carbon atoms and the other set of either R.sub.6 and R.sub.7 or R.sub.8 and R.sub.9 that is not cycloalkyl are each hydrogen.
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