Stencil, stencil material kit and stencil duplicator kit containing the same
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United States of America Patent
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Jul 1, 1986
Issued Date -
N/A
app pub date -
Mar 7, 1985
filing date -
Oct 8, 1982
priority date (Note) -
Expired
status (Latency Note)
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Abstract
This invention provides stencil from which a patternwise perforated stencil can be easily made by handwritting, a stencil material kit with which a patternwise perforated stencil can be made, and a stencil duplicator kit which, in combination with the stencil, performs simple, clear printing. The stencil is made up of a porous support and a masking film formed thereon, said masking film being made of a water-insoluble polymer having tertiary amino groups. The stencil material kit contains the stencil and a patternwise perforated stencil-making solution which forms a water-soluble product upon reaction with said polymer. Stencil printing is performed using the patternwise perforated stencil, a stencil duplicator and printing ink.
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