Radiation-sensitive plates formed using diazonium salts
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United States of America Patent
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Jun 17, 1986
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N/A
app pub date -
Sep 11, 1984
filing date -
Dec 18, 1979
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Expired
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Abstract
A radiation sensitive compound contains at least two groups having the structure ##STR1## in which Ar represents a divalent or other polyvalent radical derived from an aromatic or heteroaromatic compound; X and X' which may be the same or different, each represents O, S or an imino group, provided that at least one of X and X' is an imino group; Y represents O or S; R represents a single bond or a divalent or other polyvalent radical and A.sup.- is an anion. Radiation sensitive compositions comprising the compound and optionally a resin may be used to produce radiation sensitive plates for lithographic printing plate production.
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