Negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation
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United States of America Patent
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Dec 3, 1985
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N/A
app pub date -
Oct 5, 1982
filing date -
Sep 3, 1982
priority date (Note) -
Expired
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Abstract
An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula: ##STR1## wherein: R.sup.1 represents a halogen-containing residue of an aldehyde or a ketone; R.sup.2 represents a hydrogen atom, which may partially be substituted with an acetyl group; R.sup.3 represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.
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