Chemical vapor deposition apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Oct 8, 1985
Grant Date -
N/A
app pub date -
Aug 27, 1982
filing date -
Aug 27, 1982
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully