Chemical vapor deposition apparatus
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United States of America Patent
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Sep 10, 1985
Grant Date -
N/A
app pub date -
Aug 31, 1983
filing date -
Aug 31, 1983
priority date (Note) -
Expired
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Abstract
An improved chemical vapor deposition device having heating means substantially surrounding an inner deposition chamber for providing isothermal or precisely controlled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposition gas.
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