Non-mass-analyzed ion implantation
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United States of America Patent
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Aug 6, 1985
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N/A
app pub date -
Mar 21, 1983
filing date -
Mar 24, 1982
priority date (Note) -
Expired
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Abstract
A non-mass-analyzed ion implantation process wherein two or more species of ions of the same polarity having greatly different ion masses are generated from a compound source material, the ions are accelerated under the application of an electric field, and the accelerated ions are scanned under the application of a magnetic field so as to be implanted into a target at a distribution profile which varies with the species of ions. An ion implantation apparatus can be simplified. A large ion beam current with a large spot size can be used and ions can be implanted to the target at a large dose within a short time. Especially, the non-mass-analyzed ion implantation is advantageously utilized for production of solar batteries.
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