Process for recovery of ethylene from gaseous mixture

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United States of America Patent

PATENT NO 4525180
SERIAL NO

06590417

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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With application of new liquid absorbent, comprised of a compound selected from a group composed of silver halide and cuprous halide, an aluminium halide, a polymer selected from a group composed of styrene and styrene derivatives, and an aromatic hydrocarbon, it is possible to recover ethylene by absorbing ethylene from gaseous mixture containing ethylene such as FCC off gas, ethylene plant off gas and coke oven gas. In particular, said liquid absorbent is neither diluted nor reduced its capability to absorb ethylene by water or its vapor contained in the said gaseous mixture, so the liquid absorbent can be used repeatedly for the recovery of ethylene from gaseous mixture containing ethylene and water or its vapor, without any pretreatment to reduce the water content of said gaseous mixture.

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Patent Owner(s)

Patent OwnerAddress
HIDEFUMI HIRAIMEGURO-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hara, Susumu Tokyo, JP 47 515
Hirai, Hidefumi Tokyo, JP 18 268
Komiyama, Makoto Tokyo, JP 32 287

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