Electron beam strip-coating apparatus
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United States of America Patent
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-
Jun 25, 1985
Grant Date -
N/A
app pub date -
Apr 18, 1983
filing date -
Apr 20, 1982
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The present invention is a coating apparatus for temperature-sensitive broad strips or similar substrates. To obtain a high quality of coating, it is necessary to minimize the path of the electron beam (EB) through the vapor cloud, and to keep away backscattered electrons from the evaporating material. According to the invention, this problem is solved by assembling a sector field with a vertical field direction at the deflection system connected with the EB gun, which is followed by a deflection field with a horizontal field direction. The divergent electron beam is guided in lines to the evaporating material by the geometry of the fields.
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