Chemical etching of lithographic aluminum substrate
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United States of America Patent
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Jun 18, 1985
Grant Date -
N/A
app pub date -
Aug 13, 1982
filing date -
Aug 13, 1982
priority date (Note) -
Expired
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Abstract
The method of production of lithographic aluminum substrates which comprises first mechanically graining a surface of an aluminum sheet to obtain a pumice grained surface and then etching with a hot sulfuric acid (10-90%) solution.
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