Electron beam exposure apparatus
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United States of America Patent
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-
Apr 16, 1985
Grant Date -
N/A
app pub date -
Jun 16, 1982
filing date -
Jun 17, 1981
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Dot pattern data stored in the first dot pattern memory is read out by a predetermined number of successive bits at a time under the control of a microprocessor and corrected with respect to an X direction. The corrected dot pattern data is temporarily stored in a main memory. The dot pattern data stored in the main memory is then corrected with respect to a Y direction. The resultant corrected dot pattern data is stored in a second dot pattern memory for use for electron beam blanking control.
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