Glass for a photomask

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United States of America Patent

PATENT NO 4501819
SERIAL NO

06561750

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Abstract

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According to one aspect of the invention, there is provided glass for a photomask consisting, in weight percent, of 45 to 62% SiO.sub.2, 3 to 15% B.sub.2 O.sub.3, 12 to 25% Al.sub.2 O.sub.3, 5 to 15% MgO, 0 to 5% CaO, 0 to 5% SrO, 0 to 5% BaO, 0 to 5% ZnO, 0.5 to 5% PbO, 0 to 20% La.sub.2 O.sub.3 +Gd.sub.2 O.sub.3 +Y.sub.2 O.sub.3, 0 to 1.5% Na.sub.2 O, 0 to 1.5% K.sub.2 O, 0 to 0.5% As.sub.2 O.sub.3 and 0 to 6% Sb.sub.2 O.sub.3. This glass is easy to melt and homogenize and has good resistivity to phase separation and excellent heat resisting and refractory properties, chemical durability, ultraviolet transmittance and metal vapor deposition property. According to another aspect of the invention, there is provided glass for a photomask consisting, in weight %, 45 to 60% SiO.sub.2, 0.5 to 12% B.sub.2 O.sub.3, 10 to 22% Al.sub.2 O.sub.3, 5 to 17% MgO, 0 to 5% CaO, 0 to 8% SrO, 1.5 to 15% BaO, 1.5 to 17% ZnO, 0.5 to 10% PbO, the total content of ZnO and PbO being at least 6%, 0 to 7% Ta.sub.2 O.sub.5 +Nb.sub.2 O.sub.5 +La.sub.2 O.sub.3 +Gd.sub.2 O.sub.3 +Y.sub.2 O.sub.3 +Bi.sub.2 O.sub.3 +WO.sub.3, 0 to 5% ZrO.sub.2 +TiO.sub.2, 0 to 2.5% Na.sub.2 O+K.sub.2 O+Li.sub.2 O, 0 to 0.5% As.sub.2 O.sub.3 and 0 to 0.5% Sb.sub.2 O.sub.3. This glass has the same excellent features as the first described glass and, in addition, has further improved melt properties.

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Patent Owner(s)

Patent OwnerAddress
KABUSHIKI KAISHA OHARA KOGAKU GARASU SEIZOSHO1-15-30 OYAMA SAGAMIHARA-SHI KANAGAWA-KEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miyazaki, Mutsumi Sagamihara, JP 5 15
Yatsuda, Hisao Sagamihara, JP 4 48

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