Electron beam exposure system
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Nov 13, 1984
Grant Date -
N/A
app pub date -
Sep 30, 1982
filing date -
Sep 30, 1982
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and apparatus for reducing the number of areas multiply exposed when a workpiece is scanned by an electron beam or other exposing radiation. The areas to be exposed are described as a plurality of rectangular shapes. The method of the invention sorts the data describing the rectangles. Rectangles which overlap or abut in one direction and are coextensive in another are merged such that a smaller number of rectangles is formed. This smaller number describes an area substantially equivalent to the original pattern. The smaller number of rectangles resulting from the merging method will have a minimum of disadvantageously overlapping or abutting rectangles.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully