Electron beam sensitive mixture resist
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United States of America Patent
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May 15, 1984
Grant Date -
N/A
app pub date -
Mar 31, 1983
filing date -
Mar 31, 1983
priority date (Note) -
Expired
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Abstract
This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of the mixture of the half-ester or half amide product of reaction of an N-hydroxy or N-aminoalkyl amide with an alkylvinyl ether-maleic anhydride copolymer and the products of reaction of a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by mixing the product of reaction of hydroxyethyl pyrrolidone and octadecylvinyl ether--maleic anhydride copolymer with the products of reaction of the mixture of hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.
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