Electron beam sensitive resist of an anhydride copolymer

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4375398
SERIAL NO

06381287

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

This invention describes an ionizing radiation sensitive material having high contrast, high sensitivity and comprised of a mixed half-ester or half amide of the reaction of an N-hydroxy or N-aminoalkyl amide and a hydroxy alkyl terminally unsaturated compound with an alkylvinyl ether-maleic anhydride copolymer. A typical material is made by reacting hydroxyethyl pyrrolidone and hydroxyethyl acrylate with octadecylvinyl ether-maleic anhydride copolymer.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
GAF CHEMICALS CORPORATION1361 ALPS ROAD WAYNE NEW JERSEY 07470

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lorenz, Donald H Basking Ridge, NJ 36 1155
Williams, Earl P Pen Argyl, PA 8 58

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation