Gas control system for chemical vapor deposition system
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United States of America Patent
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Jan 18, 1983
Grant Date -
N/A
app pub date -
Sep 15, 1981
filing date -
Sep 15, 1981
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A gas flow control system in which several constituent gases are mixed and the mixture delivered through controlled injectors to a processing zone. Mass flow controllers control the injector flows with one of the controllers being a master and the other being slaved to provide a selected percentage of the flow through the master controller. The gas mix is regulated by a mass flow controller on one of the constituents and a flow meter on the other, the flow meter producing an error signal which is used to readjust the total flow through the injectors by control of the master injector flow controller.
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