Processing of radiation sensitive plates
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United States of America Patent
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Sep 21, 1982
Grant Date -
N/A
app pub date -
Feb 4, 1981
filing date -
Jan 29, 1980
priority date (Note) -
Expired
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Abstract
A developer for processing image-wise exposed negative-working radiation sensitive plates based on organic solvent soluble diazo resins or certain photocrosslinkable resins or photopolymerizable olefinically unsaturated compounds includes a surfactant and a salt of an aliphatic carboxylic acid containing up to nine carbon atoms. The developer is substantially aqueous and has a reduced tendency to foam formation. It is useful in the photomechanical production of lithographic printing plates.
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