Element having phosphine activated photosensitive compositions therein
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
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Aug 11, 1981
Issued Date -
N/A
app pub date -
Jun 23, 1980
filing date -
Sep 11, 1978
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A photopolymerizable composition and photosensitive elements produced therefrom are disclosed. The photopolymerizable composition includes: (a) a monomer component, (b) a polymer component, (c) a photopolymerization initiator, and (d) an activator. The monomer component contains at least one water soluble, monofunctional unsaturated ethylenic monomer or the combination of such a monomer and at least one polyfunctional unsaturated ethylenic monomer. The polymer component includes a partially saponified water soluble, polyvinyl acetate polymer compatible with the monomer components. The polyvinyl acetate polymer contains both acetyl and hydroxyl groups and has a polymerization degree of from 300-2000. The degree of saponification of the polymer is desirably in the range of 65 to 99 percent. The preferred photopolymerizaton initiators are acetophenone derivatives such as 2,2-dimethoxy-2-phenyl acetopheonone, 2,2-diethoxy-2-phenyl acetophenone, 2,-2-diisopropoxy-2-phenyl acetophenone, benzoin alkyl, aryl, allyl or vinyl ethers, or benzophenone derivatives such as benzophenone, 2-methylbenzophenone, 2-methoxybenzophenone or 2,2'-dimethoxybenzophenone, which are compatible with the monomer component and the polyvinyl acetate polymer and are activatable by actinic light. Finally, the activator is a phosphine derivative generally described by the formula: ##STR1## wherein any of X, Y and Z are hydrogen, halogen, alkyl, alkoxy, aryl, vinyl, or allyl, although not more than one of X, Y and Z may be hydrogen. It is especially preferred in the practice of the present invention that at least one of X, Y or Z in the phosphine derivative activator component be an aryl group.
First Claim
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Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
Patent Owner | Address | |
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NAPP SYSTEMS (USA) INC | SAN MARCOS CA |
International Classification(s)

- 1980 Application Filing Year
- G03C Class
- 509 Applications Filed
- 1 Patents Issued To-Date
- 0.20 % Issued To-Date
Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Kimoto, Koichi | Oceanside, CA | 17 | 278 |
# of filed Patents : 17 Total Citations : 278 | |||
Okai, Sakuo | Carlsbad, CA | 3 | 14 |
# of filed Patents : 3 Total Citations : 14 |
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Patent Citation Ranking
- 2 Citation Count
- G03C Class
- 0 % this patent is cited more than
- 44 Age
Forward Cite Landscape
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Maintenance Fees
Fee | Large entity fee | small entity fee | micro entity fee | due date |
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Fee | Large entity fee | small entity fee | micro entity fee |
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Surcharge after expiration - Late payment is unavoidable | $700.00 | $350.00 | $175.00 |
Surcharge after expiration - Late payment is unintentional | $1,640.00 | $820.00 | $410.00 |
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