Photosensitive diazonium compound containing composition and article with .beta.-hydroxyalkyl acrylate or methacrylate

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United States of America Patent

PATENT NO 4275138
SERIAL NO

05723061

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A photosensitive composition is prepared comprising a diazonium compound and a polymer containing at least 50% by weight of the recurring unit represented by the following general formula (I): ##STR1## wherein R.sub.1 represents hydrogen atom or methyl group, R.sub.2 represents hydrogen atom or a methyl, ethyl or chloromethyl group and n is an integer of 1 to 10.

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Patent Owner(s)

  • FUJI PHOTO FILM CO., LTD.;NATIONAL PATENT DEVELOPMENT CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kita, Nobuyuki Udawara, JP 41 644
Narutomi, Yasuhisa Udawara, JP 2 24

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