Closure for thermal reactor
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United States of America Patent
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-
Mar 3, 1981
Grant Date -
N/A
app pub date -
Feb 21, 1980
filing date -
Feb 21, 1980
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Apparatus for thermal oxidation of silicon wafers at high pressures of a type wherein a reactor of a refractory material is disposed within a pressure vessel, and wherein a margin of a wafer portal of the reactor and a closure of the refractory material have congruent surfaces enabling a hermetic seal to be effected, an improvement is disclosed wherein the closure is mounted within a pressure-vessel head used to close an access portal of the pressure vessel by means of gimbals, whereby a hermetic seal can be effected at said surfaces despite misalignments.
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